Welcome to Materials Engineering 297

Fundamentals of Plasma Assisted Materials Processing

Tuesdays 6:00 – 8:50

Room SCI 253

Instructor – Dr. Steven Shannon, Adjunct Faculty

Office Hours – before and after class and by appointment

Course Info Greensheet Course Schedule Textbook Info Grades

Homeworks Homework#1 Homework#2 Homework#3 Homework#4 Homework#5 Homework#6 Homework #7 Homework #8 Homework #9 Homework #10

Lecture Notes Course Introduction Plasma Basics Plasma Dynamics Plasma Sheaths Plasma Chemistry Particle and Energy Balance RF Plasmas Wave Heated and DC Plasmas Material Removal Material Deposition and Modification

Solutions Homework#1 Homework#2 Homework#3 Homework#4 Homework#5 Homework#6 Homework#7 Homework#8 Homework#9 Homework#10 Midterm#1 Midterm#2 Final Exam

Plasma Application Reviews by Students (Students Click Here for Report Guidelines):

plasma assisted atomic layer deposition

hairpin resonator probes for plasma measurement

neutral beam discharges

biological application of plasmas

thermionic cathodes

plasma lasers

dielectric barrier discharges

ion energy distribution functions in RF plasmas

neutral loop plasmas

plasma abatement systems for semiconductor processing

environmentally safe plasma chemistries for IC manufacturing

light sources for EUV lithography

microplasmas

series resonant plasma discharges

FTIR spectroscopy analysis of plasma chemistry

ICP mass spectrometers

laser ablation of materials

bosch process

very high frequency RF plasmas (>50MHz)

plasma sterilization